Cr/C Reflective Multilayer for Wavelength of 44.8 Å
Author(s) -
Jingtao Zhu,
Jinwen Chen,
Haochuan Li,
Jiayi Zhang,
Mingqi Cui
Publication year - 2018
Publication title -
journal of nanoscience and nanotechnology
Language(s) - English
Resource type - Journals
eISSN - 1533-4899
pISSN - 1533-4880
DOI - 10.1166/jnn.2019.16475
Subject(s) - materials science , wafer , water window , optics , synchrotron radiation , sputter deposition , wavelength , transmission electron microscopy , reflection (computer programming) , layer (electronics) , laser , optoelectronics , sputtering , thin film , nanotechnology , computer science , programming language , physics
The working wavelength of Ni-like, Ta soft X-ray laser is 44.8 Å, just near the "water window." High reflection multilayers are required for this kind of laser in China. In this work, we design and fabricate carbon-based multilayer reflective samples. The Cr/C multilayer was selected from proposed candidates such as Co/C, Ni/C, and CoCr/C material combinations. The period thickness is only 22.6 Å. Cr/C multilayers were deposited by the magnetron sputtering method. Multilayers with bi-layer numbers of 150, 200, 250 and 300 were deposited onto super polished silicon wafers. All multilayers have been characterized by grazing incidence X-ray reflectance (GIXRR). Then, near-normal incidence reflectance measurements were performed at beamline 3W1B, Beijing synchrotron radiation (BSRF). The highest reflectance of 13.2% is achieved with the bi-layer number of 300. Transmission electron microscopy measurements also clearly show the sharp Cr-C interfaces in the multilayer.
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