z-logo
open-access-imgOpen Access
Effect of Vanadium Doping on Microstructure and Dielectric Behavior of CaCu<sub>3</sub>Ti<sub>4</sub>O<sub>12</sub> Ceramics
Author(s) -
Séka Simplice Kouassi,
Jean-Pierre S. Sagou,
Cécile Autret-Lambert,
Sonia de Almeida-Didry,
Anoop Nautiyal,
Marc Lethiecq
Publication year - 2017
Publication title -
international journal of materials science and applications
Language(s) - English
Resource type - Journals
eISSN - 2327-2643
pISSN - 2327-2635
DOI - 10.11648/j.ijmsa.20170601.18
Subject(s) - vanadium , dielectric , doping , materials science , microstructure , permittivity , relaxation (psychology) , analytical chemistry (journal) , conductivity , electrical resistivity and conductivity , grain boundary , condensed matter physics , nuclear magnetic resonance , chemistry , metallurgy , electrical engineering , physics , optoelectronics , psychology , social psychology , chromatography , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom