Effect of Compressed Plasma Flow on Tantalum-Titanium Thin Layer Deposited on Silicon Substrate
Author(s) -
Amir Hossein Sari
Publication year - 2014
Publication title -
international journal of materials science and applications
Language(s) - English
Resource type - Journals
eISSN - 2327-2643
pISSN - 2327-2635
DOI - 10.11648/j.ijmsa.20140303.14
Subject(s) - materials science , plasma , substrate (aquarium) , silicon , scanning electron microscope , analytical chemistry (journal) , titanium , tantalum , layer (electronics) , optoelectronics , composite material , metallurgy , chemistry , oceanography , physics , chromatography , quantum mechanics , geology
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