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High Temperature Texture Goniometer for in Situ Measurements of Transformation Textures
Author(s) -
G. Brückner,
F. Reher,
Günter Gottstein
Publication year - 1998
Publication title -
texture stress and microstructure
Language(s) - English
Resource type - Journals
eISSN - 1687-5400
pISSN - 1687-5397
DOI - 10.1155/tsm.30.125
Subject(s) - goniometer , kapton , materials science , foil method , annealing (glass) , texture (cosmology) , composite material , in situ , optics , polyimide , chemistry , computer science , physics , layer (electronics) , image (mathematics) , artificial intelligence , organic chemistry
A high temperature stage was designed for mounting onto a computer controlled four circle X-ray texture goniometer. This technique allowed to conduct in situ texture measurement, i.e. the determination of the texture evolution during rather than subsequent to annealing. The device was employed for temperatures up to 1000°C.

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