Open AccessThe Problems of Selecting a Proper Microlithographic Imaging System
Author(s) -
L. D. Ugray
Publication year - 1981
Publication title -
active and passive electronic components
Language(s) - English
Resource type - Journals
eISSN - 1026-7034
pISSN - 0882-7516
DOI - 10.1155/apec.9.249
Subject(s) - wafer , integrated circuit , lithography , electronic circuit , fabrication , engineering , state (computer science) , systems engineering , semiconductor device fabrication , manufacturing engineering , computer science , reliability engineering , electronic engineering , engineering drawing , electrical engineering , materials science , medicine , alternative medicine , optoelectronics , pathology , algorithm
Considering the increased importance of custom integrated circuits in electronic equipments and other products there is a research activity in Hungary to develop a “state-of-the-art” semiconductor development laboratory for technology development and prototype circuit fabrication. The most significant parts of this laboratory are circuit design, mask making and wafer lithography. The problems associated with these three parts are discussed.
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