Electrical Properties of Epitaxial Aluminium Films
Author(s) -
E. Dobierzewska-Mozrzymas,
F. Warkusz
Publication year - 1978
Publication title -
active and passive electronic components
Language(s) - English
Resource type - Journals
eISSN - 1026-7034
pISSN - 0882-7516
DOI - 10.1155/apec.5.223
Subject(s) - specular reflection , electrical resistivity and conductivity , monocrystalline silicon , aluminium , materials science , transmission coefficient , epitaxy , grain boundary , temperature coefficient , reflection (computer programming) , condensed matter physics , composite material , optics , transmission (telecommunications) , metallurgy , silicon , microstructure , physics , electrical engineering , engineering , layer (electronics) , computer science , programming language
The resistivity of monocrystalline Al films was measured and compared with the resistivity calculated in terms of the function which takes into account both the external and the internal size effects. A comparison of the theoretical and experimental curves shows that the specular reflection coefficient ( p ) is small, while the coefficient of electron transmission through the grain boundary ( r ) increases with increasing film thickness.
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