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Size and Grain-Boundary Effects in the Electrical Conductivity of Thin Monocrystalline Films
Author(s) -
C. R. Tellier
Publication year - 1978
Publication title -
active and passive electronic components
Language(s) - English
Resource type - Journals
eISSN - 1026-7034
pISSN - 0882-7516
DOI - 10.1155/apec.5.127
Subject(s) - monocrystalline silicon , materials science , grain boundary , electrical resistivity and conductivity , conductivity , grain size , condensed matter physics , thin film , composite material , optoelectronics , nanotechnology , electrical engineering , silicon , physics , chemistry , engineering , microstructure
By assuming that the scattering processes from other sources than grain-boundaries can be described by a single relaxation time τ ∗ and then by solving a Boltzmann equation in which grain-boundary scattering is accounted for, we have obtained an analytical expression for the thin monocrystalline film conductivity in terms of the reduced thickness k and the grain-boundary reflection coefficient r . Numerical tables are given to show the agreement of the above expression with the Mayadas-Shatzkes expression.

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