Techniques for the Examination of Thick Film Resistor Microstructures by T.E.M. | Zendy

D.J. Pedder | Zendy

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Techniques for the Examination of Thick Film Resistor Microstructures by T.E.M.

Author(s) -

D.J. Pedder

Publication year - 1977

Publication title -

active and passive electronic components

Language(s) - English

Resource type - Journals

eISSN - 1026-7034

pISSN - 0882-7516

DOI - 10.1155/apec.4.85

Subject(s) - resistor , microstructure , transmission electron microscopy , materials science , bismuth , scanning electron microscope , electron microscope , optoelectronics , optics , nanotechnology , voltage , composite material , electrical engineering , metallurgy , physics , engineering

This paper discusses the preparation techniques which can be used for the examination of thick film resistor microstructures by Transmission Electron Microscopy. The application of this technique, including High Voltage Electron Microscopy and Electron Microscope Mass Analysis, to both Ruthenium Dioxide and Bismuth Ruthenate based thick film resistors, is considered.

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