Reproducibility of Properties of SnOx Thin Films Prepared by Reactive Sputtering | Zendy

Grażyna Beensh-Marchwicka | Zendy; L. Król-Stępniewska | Zendy

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Reproducibility of Properties of SnO_x Thin Films Prepared by Reactive Sputtering

Author(s) -

Grażyna Beensh-Marchwicka,

L. Król-Stępniewska

Publication year - 1983

Publication title -

active and passive electronic components

Language(s) - English

Resource type - Journals

eISSN - 1026-7034

pISSN - 0882-7516

DOI - 10.1155/apec.11.271

Subject(s) - sputtering , tin dioxide , tin , materials science , reproducibility , antimony , electrical resistivity and conductivity , argon , thin film , analytical chemistry (journal) , substrate (aquarium) , microstructure , oxygen , transmittance , metallurgy , nanotechnology , chemistry , optoelectronics , oceanography , engineering , organic chemistry , chromatography , geology , electrical engineering

The preparation of tin dioxide films by low energy reactive sputtering of tin and tin-antimony (1-10% wt. Sb) in an oxygen – argon atmosphere is described. The dependences of oxygen content in the range from 0 to 50%, target compositions, substrate temperature of 300 K-573 K on minimum resistivity at satisfactory transmittance and on reproducibility are discussed. The correlation between the electrical and optical properties and the microstructure of the films is shown.

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