z-logo
open-access-imgOpen Access
A Simulative Approach to Electron Conduction in Thick‐Film Resistors
Author(s) -
Carlo Jacoboni,
M. Prudenziati,
A. Rizzi
Publication year - 1983
Publication title -
active and passive electronic components
Language(s) - English
Resource type - Journals
eISSN - 1026-7034
pISSN - 0882-7516
DOI - 10.1155/apec.10.103
Subject(s) - resistor , thermal conduction , electron , materials science , electrical engineering , optoelectronics , physics , composite material , engineering , nuclear physics , voltage
A simulative approach to the calculation of electrical transport in thick-film resistors is presented, in which electrons are considered to hop from and to metallic grains and localized states in the glass. For concentrations of metallic grains sufficiently low and of localized states sufficiently high, a maximum in conductivity as a function of temperature is obtained due to a balance between the tendency of temperature to favour hopping and to oppose an ordered response to an external force.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom