Open AccessMicro- and Nanostructure of Layered Si\Sn\Si Films, Formed by Vapor Deposition
Author(s) -
V. B. Neimash,
P. Ye. Shepelyavyi,
А.С. Ніколенко,
V. V. Strelchuk,
V. I. Chegel
Publication year - 2022
Publication title -
journal of nanomaterials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.463
H-Index - 66
eISSN - 1687-4129
pISSN - 1687-4110
DOI - 10.1155/2022/7910708
Subject(s) - materials science , silicon , tin , nanostructure , amorphous solid , deposition (geology) , chemical vapor deposition , nanotechnology , surface roughness , chemical engineering , composite material , optoelectronics , metallurgy , crystallography , paleontology , chemistry , sediment , engineering , biology
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