KLL Dielectronic Recombination of Highly Charged Sulfur and Silicon Ions | Zendy

Safdar Ali | Zendy

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KLL Dielectronic Recombination of Highly Charged Sulfur and Silicon Ions

Author(s) -

Safdar Ali

Publication year - 2014

Publication title -

journal of atomic and molecular physics

Language(s) - English

Resource type - Journals

ISSN - 2314-8039

DOI - 10.1155/2014/752934

Subject(s) - ion , atomic physics , highly charged ion , silicon , charged particle , scaling , recombination , electron beam ion trap , resonance (particle physics) , sulfur , chemistry , electron , physics , cathode ray , nuclear physics , ion source , biochemistry , geometry , mathematics , organic chemistry , gene

Dielectronic recombination measurements for highly charged ions were performed at the Stockholm refrigerated electron beam ion trap. We have obtained KLL DR resonance strengths for highly charged H- and He-like sulfur and silicon ions. The experimental results are compared with the theoretical data obtained from GRASP II code. Both the experimental and calculated results agree well within the experimental error bars. Moreover, the dielectronic recombination resonance strengths are used to obtain the new scaling parameters by incorporating our results with the previous measurements and to check the behaviour of scaling formula for H- and He-like isoelectronic sequences.

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