NO2 Sensing Properties of WO3 Thin Films Deposited by Rf-Magnetron Sputtering | Zendy

Savita Sharma | Zendy; Monika Tomar | Zendy; Nitin K. Puri | Zendy; Vinay Gupta | Zendy

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NO₂ Sensing Properties of WO₃ Thin Films Deposited by Rf-Magnetron Sputtering

Author(s) -

Savita Sharma,

Monika Tomar,

Nitin K. Puri,

Vinay Gupta

Publication year - 2014

Publication title -

conference papers in science

Language(s) - English

Resource type - Journals

eISSN - 2356-6108

pISSN - 2356-6094

DOI - 10.1155/2014/683219

Subject(s) - tungsten trioxide , materials science , thin film , sputter deposition , nanoclusters , sputtering , tungsten , diffraction , analytical chemistry (journal) , cavity magnetron , optoelectronics , chemical engineering , nanotechnology , optics , metallurgy , chemistry , physics , chromatography , engineering

Tungsten trioxide (WO3) thin films were deposited by Rf-magnetron sputtering onto Pt interdigital electrodes fabricated on corning glass substrates. NO2 gas sensing properties of the prepared WO3 thin films were investigated by incorporation of catalysts (Sn, Zn, and Pt) in the form of nanoclusters. The structural and optical properties of the deposited WO3 thin films have been studied by X-ray diffraction (XRD) and UV-Visible spectroscopy, respectively. The gas sensing characteristics of all the prepared sensor structures were studied towards 5 ppm of NO2 gas. The maximum sensing response of about 238 was observed for WO3 film having Sn catalyst at a comparatively lower operating temperature of 200°C. The possible sensing mechanism has been highlighted to support the obtained results.

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