Thickness and Interface-Dependent Structural, Magnetic, and Transport Properties of Cu/Co Thin Film and Multilayer Structures
Author(s) -
Ranjeet Brajpuriya
Publication year - 2014
Publication title -
journal of experimental physics
Language(s) - English
Resource type - Journals
eISSN - 2356-7368
pISSN - 2314-7849
DOI - 10.1155/2014/569691
Subject(s) - materials science , coercivity , nanocrystalline material , electrical resistivity and conductivity , amorphous solid , thin film , condensed matter physics , saturation (graph theory) , electron diffraction , diffraction , anisotropy , composite material , optics , crystallography , nanotechnology , chemistry , physics , mathematics , engineering , combinatorics , electrical engineering
Structural, magnetic, and transport properties of electron beam evaporated Co/Cu thin films and multilayer structures (MLS) having different layer thicknesses have been characterized utilizing X-ray diffraction (XRD), magnetooptical Kerr effect (MOKE), and resistivity techniques. The structural studies show distinctive crystal structures for different sublayer thicknesses. The Co (300 A) single layer film is amorphous, while Cu (300 A) film is nanocrystalline in nature. The average particle size is found to decrease as the number of interface increases. The corresponding magnetic and resistivity measurements show an increase in saturation field and resistivity as a result of an enhanced anisotropy. However, coercivity decreases with a reduction in average particle size. The results conclude that these properties are greatly influenced by various microstructural parameters such as layer thickness, number of bilayers, and the quality of interfaces molded under different growth conditions.
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