Direct Current Magnetron Glow Discharge Plasma Characteristics Study for Controlled Deposition of Titanium Nitride Thin Film | Zendy

Sankar Moni Borah | Zendy

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Direct Current Magnetron Glow Discharge Plasma Characteristics Study for Controlled Deposition of Titanium Nitride Thin Film

Author(s) -

Sankar Moni Borah

Publication year - 2013

Publication title -

journal of materials

Language(s) - English

Resource type - Journals

eISSN - 2314-4874

pISSN - 2314-4866

DOI - 10.1155/2013/852859

Subject(s) - cavity magnetron , titanium nitride , argon , plasma , materials science , langmuir probe , thin film , tin , titanium , sputter deposition , glow discharge , nitride , deposition (geology) , analytical chemistry (journal) , plasma diagnostics , sputtering , chemistry , composite material , layer (electronics) , metallurgy , nanotechnology , physics , environmental chemistry , paleontology , organic chemistry , quantum mechanics , sediment , biology

This paper reports on the study of direct current (DC) magnetron glow discharge plasma characteristics in a cylindrical magnetron system in argon-nitrogen. Presence of nitrogen gas makes the plasma environment reactive, and it results in significant changes of the plasma properties—number density, electron temperature, floating potential, and sheath thickness. Applied magnetic field is a parameter which is closely related to proper deposition of thin film. Cylindrical Langmuir probe and Emissive probe are used as diagnostics for the estimation of various plasma parameters indicated earlier. Controlled titanium nitride (TiN) thin film deposition on bell-metal at different argon-nitrogen gases ratio is another important study reported

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