Copper Corrosion by Atmospheric Pollutants in the Electronics Industry
Author(s) -
Benjamín Valdez,
Μ. Schorr,
Roumen Zlatev Koytchev,
Gustavo López Badilla,
Rogelio Ramos,
Mónica Carrillo,
N. Nedev,
Mario Curiel,
Navor Rosas Gonzalez,
J. M. Bastidas
Publication year - 2013
Publication title -
isrn corrosion
Language(s) - English
Resource type - Journals
ISSN - 2090-8903
DOI - 10.1155/2013/846405
Subject(s) - pollutant , corrosion , oxidizing agent , copper , metallurgy , environmental chemistry , cuprite , metal , materials science , environmental science , environmental engineering , chemistry , organic chemistry
Hydrogen sulphide (H2S) is considered one of the most corrosive atmospheric pollutants. It is a weak, diprotic, reducing acid, readily soluble in water and dispersed into the air by winds when emitted from natural, industrial, and anthropogenic sources. It is a pollutant with a high level of toxicity impairing human health and the environment quality. It attacks copper forming thin films of metallic sulphides or dendrite whiskers, which are cathodic to the metal substrate, enhancing corrosion. H2S is actively involved in microbially influenced corrosion (MIC) which develops in water, involving sulphur based bacteria, in oxidizing and reducing chemical reactions. H2S is found in concentrated geothermal brines, in the atmosphere of geothermal fields, and in municipal sewage systems. Other active atmospheric pollutants include SOX, NOX, and CO. This investigation reports on the effects of H2S on copper in microelectronic components of equipment and devices, with the formation of nonconductive films that lead to electrical failures.
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