Structural and Optical Properties of Aluminum Nitride Thin Films Deposited by Pulsed DC Magnetron Sputtering | Zendy

R. K. Choudhary | Zendy; Prabhash Mishra | Zendy; A. Biswas | Zendy; A.C. Bidaye | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Structural and Optical Properties of Aluminum Nitride Thin Films Deposited by Pulsed DC Magnetron Sputtering

Author(s) -

R. K. Choudhary,

Prabhash Mishra,

A. Biswas,

A.C. Bidaye

Publication year - 2013

Publication title -

isrn materials science

Language(s) - English

Resource type - Journals

eISSN - 2090-6099

pISSN - 2090-6080

DOI - 10.1155/2013/759462

Subject(s) - materials science , thin film , analytical chemistry (journal) , sputter deposition , pulsed dc , wurtzite crystal structure , ellipsometry , sputtering , substrate (aquarium) , nitride , metallurgy , composite material , layer (electronics) , nanotechnology , chemistry , zinc , oceanography , chromatography , geology

Aluminum nitride thin films were deposited on Si (100) substrate by pulsed DC (asymmetric bipolar) reactive magnetron sputtering under variable nitrogen flow in a gas mixture of argon and nitrogen. The deposited film was characterized by grazing incidence X-ray diffraction (GIXRD), atomic force microscope (AFM), spectroscopic ellipsometry, and secondary ion mass spectroscopy (SIMS). GIXRD results have shown (100) reflection of wurtzite AlN, whereas AFM micrographs have revealed very fine grained microstructure with average roughness in the range 6–8 nm. Spectroscopic ellipsometry measurements have indicated the band gap and refractive index of the film in the range 5.0–5.48 eV and 1.58–1.84, respectively. SIMS measurement has indicated the presence of oxygen in the film.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research