Preparation and Characterization of (Au/n-Sn/Si/Si/Al) MIS Device for Optoelectronic Application | Zendy

Marwa Abdul Muhsien | Zendy; Evan T. Salem | Zendy; Ibrahim R. Agool | Zendy

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Preparation and Characterization of (Au/n-Sn/Si/Si/Al) MIS Device for Optoelectronic Application

Author(s) -

Marwa Abdul Muhsien,

Evan T. Salem,

Ibrahim R. Agool

Publication year - 2013

Publication title -

international journal of optics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.263

H-Index - 17

eISSN - 1687-9392

pISSN - 1687-9384

DOI - 10.1155/2013/756402

Subject(s) - materials science , silicon , substrate (aquarium) , layer (electronics) , thermal oxidation , semiconductor , optoelectronics , characterization (materials science) , doping , analytical chemistry (journal) , nanotechnology , chemistry , oceanography , chromatography , geology

SnO2 thin films were prepared by using rapid thermal oxidation (RTO) of Sn at oxidation temperature 873 K and oxidation time 90 sec on semiconductor n-type and p-type silicon substrate. In order to characterize the prepared device, the electrical properties have been measured which revealed that the barrier height is greatly depended on interfacial layer thickness (SiO2). The value of peak response (n-SnO2/SiO2/n-Si) device was 0.16 A/W which is greater than that of (n-SnO2/SiO2/p-Si) device whose value was 0.12 A/W, while the rise time was found to be shorter

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