Raman Spectroscopy of Amorphous Carbon Prepared by Pulsed Arc Discharge in Various Gas Mixtures
Author(s) -
Marián Marton,
Marián Vojs,
E. Zdravecká,
Marcel Himmerlich,
Thomas Haensel,
Stefan Krischok,
Mário Kotlár,
Pavol Michniak,
Martin Veselý,
R Redhammer
Publication year - 2012
Publication title -
journal of spectroscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.323
H-Index - 21
eISSN - 2314-4920
pISSN - 2314-4939
DOI - 10.1155/2013/467079
Subject(s) - raman spectroscopy , materials science , amorphous carbon , analytical chemistry (journal) , argon , amorphous solid , thin film , raman scattering , hydrogen , carbon fibers , electric arc , carbon film , nanotechnology , composite material , chemistry , optics , crystallography , electrode , composite number , physics , organic chemistry , chromatography
To meet various application requirements, it is important to enable an improvement of a-C structure and properties, such as hardness, adhesion, and wear resistance. In this study, we used the Raman spectroscopy to investigate the a-C thin films structure dependence on the different deposition parameters. The effect of nitrogen, argon, and hydrogen gas flow rate was analyzed to determine the influence on the film properties. The change in the gas type, combination, and flow had a significant influence on the D and G bands of the a-C Raman spectra. The addition of N2 into the chamber promoted the sp2 creation, while with adding hydrogen the layer contained more sp3 bonds. The depositions of a-C thin films were carried out in pulsed arc discharge vacuum installation. Micro-Raman measurements of the deposited materials were performed using an ISA Dilor-Jobin Yvon-Spex Labram confocal system with 632.8 nm radiation from a He-Ne laser using a back-scattering geometry
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