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Potentiostatic Deposition and Characterization of Cuprous Oxide Thin Films
Author(s) -
Abdelhamid ElShaer,
A.R. Abd-Elwahed
Publication year - 2013
Publication title -
isrn nanotechnology
Language(s) - English
Resource type - Journals
eISSN - 2090-6072
pISSN - 2090-6064
DOI - 10.1155/2013/271545
Subject(s) - thin film , tin oxide , materials science , deposition (geology) , substrate (aquarium) , oxide , doping , chemical engineering , characterization (materials science) , inorganic chemistry , tin , metallurgy , nanotechnology , chemistry , optoelectronics , paleontology , oceanography , sediment , geology , engineering , biology
Electrodeposition technique was employed to deposit cuprous oxide Cu2O thin films. In this work, Cu2O thin films have been grown on fluorine doped tin oxide (FTO) transparent conducting glass as a substrate by potentiostatic deposition of cupric acetate. The effect of deposition time on the morphologies, crystalline, and optical quality of Cu2O thin films was investigated.

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