Series Resistance Analysis of Passivated Emitter Rear Contact Cells Patterned Using Inkjet Printing
Author(s) -
M. Lenio,
J. K. Howard,
Doris Lu,
Fabian Jentschke,
Y. Augarten,
Alison Len,
Stuart Wenham
Publication year - 2012
Publication title -
advances in materials science and engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.356
H-Index - 42
eISSN - 1687-8442
pISSN - 1687-8434
DOI - 10.1155/2012/965418
Subject(s) - materials science , common emitter , equivalent series resistance , inkjet printing , contact resistance , plating (geology) , optoelectronics , screen printing , passivation , inkwell , photoluminescence , nanotechnology , composite material , electrical engineering , layer (electronics) , voltage , geophysics , geology , engineering
For higher-efficiency solar cell structures, such as the Passivated Emitter Rear Contact (PERC) cells, to be fabricated in a manufacturing environment, potentially low-cost techniques such as inkjet printing and metal plating are desirable. A common problem that is experienced when fabricating PERC cells is low fill factors due to high series resistance. This paper identifies and attempts to quantify sources of series resistance in inkjet-patterned PERC cells that employ electroless or light-induced nickel-plating techniques followed by copper light-induced plating. Photoluminescence imaging is used to determine locations of series resistance losses in these inkjet-patterned and plated PERC cells
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