Open AccessReactive Chemical Vapor Deposition Method as New Approach for Obtaining Electroluminescent Thin Film Materials
Author(s) -
Valentina V. Utochnikova,
Oxana Kotova,
Andrey A. Vaschenko,
Leonid S. Lepnev,
Å.G. Vitukhnovsky,
Natalia P. Kuzmina
Publication year - 2012
Publication title -
advances in materials science and engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.356
H-Index - 42
eISSN - 1687-8442
pISSN - 1687-8434
DOI - 10.1155/2012/809028
Subject(s) - terbium , materials science , europium , thin film , electroluminescence , lanthanide , luminescence , chemical vapor deposition , deposition (geology) , oled , combustion chemical vapor deposition , inorganic chemistry , photochemistry , ion , organic chemistry , nanotechnology , optoelectronics , carbon film , chemistry , paleontology , layer (electronics) , sediment , biology
The new reactive chemical vapor deposition (RCVD) method has been proposed for thin film deposition of luminescent nonvolatile lanthanide aromatic carboxylates. This method is based on metathesis reaction between the vapors of volatile lanthanide dipivaloylmethanate (Ln(dpm)3) and carboxylic acid (HCarb orH2Carb′) and was successfully used in case of HCarb. Advantages of the method were demonstrated on example of terbium benzoate (Tb(bz)3) and o-phenoxybenzoate thin films, and Tb(bz)3 thin films were successfully examined in the OLED with the following structure glass/ITO/PEDOT:PSS/TPD/Tb(bz)3/Ca/Al. Electroluminescence spectra of Tb(bz)3 showed only typical luminescent bands, originated from transitions of the terbium ion. Method peculiarities for deposition of compounds of dibasic acids H2Carb′ are established on example of terbium and europium terephtalates and europium 2,6-naphtalenedicarboxylate
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