Open AccessGas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor
Author(s) -
Seung Oh Kang,
Uk June Lee,
SeungHyun Kim,
Ho Jung You,
Kun Park,
Sung Eun Park,
Jong Hoon Park
Publication year - 2012
Publication title -
international journal of photoenergy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.426
H-Index - 51
eISSN - 1687-529X
pISSN - 1110-662X
DOI - 10.1155/2012/697653
Subject(s) - nozzle , siemens , deposition (geology) , materials science , activation energy , analytical chemistry (journal) , chemistry , physics , electrical engineering , thermodynamics , chromatography , engineering , paleontology , sediment , biology
Deposition of polysilicon (poly-Si) was tried to increase productivity of poly-Si by using two different types of gas nozzle in a monosilane Bell-jar Siemens (MS-Siemens) reactor. In a mass production of poly-Si, deposition rate and energy consumption are very important factors because they are main performance indicators of Siemens reactor and they are directly related with the production cost of poly-Si. Type A and B nozzles were used for investigating gas nozzle effect on the deposition of poly-Si in a MS-Siemens reactor. Nozzle design was analyzed by computation cluid dynamics (CFD). Deposition rate and energy consumption of poly-Si were increased when the type B nozzle was used. The highest deposition rate was 1 mm/h, and the lowest energy consumption was −1 in this study.
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