Iron Oxide Arrays Prepared from Ferrocene- and Silsesquioxane-Containing Block Copolymers | Zendy

Raita Goseki | Zendy; Tomoyasu Hirai | Zendy; Masa-aki Kakimoto | Zendy; Teruaki Hayakawa | Zendy

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Iron Oxide Arrays Prepared from Ferrocene- and Silsesquioxane-Containing Block Copolymers

Author(s) -

Raita Goseki,

Tomoyasu Hirai,

Masa-aki Kakimoto,

Teruaki Hayakawa

Publication year - 2012

Publication title -

international journal of polymer science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.399

H-Index - 33

eISSN - 1687-9430

pISSN - 1687-9422

DOI - 10.1155/2012/692604

Subject(s) - materials science , copolymer , silsesquioxane , chemical engineering , ferrocene , transmission electron microscopy , tetrahydrofuran , small angle x ray scattering , scanning electron microscope , polymer chemistry , nanostructure , annealing (glass) , thin film , wafer , solvent , nanotechnology , scattering , organic chemistry , composite material , electrochemistry , polymer , chemistry , electrode , optics , physics , engineering

Arrays of iron oxides as precursors of iron clusters were prepared by oxygen plasma treatment of block copolymer microphase-separated nanostructures in thin films. Block copolymers composed of ferrocene-containing and silsesquioxane-containing polymethacrylate (PMAPOSS-b-PMAHFC) were successfully prepared, with different molecular weights and compositions and narrow molecular weight distributions, by living anionic polymerization. The formed microphase-separated nanostructures in the bulk were characterized by wide- and small-angle X-ray scattering (WAXS and SAXS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Thin films were prepared from a solution of PMAPOSS-b-PMAHFC in tetrahydrofuran by spin coating onto silicon wafers. Fingerprint-type line nanostructures were formed in the PMAPOSS-b-PMAHFCs thin films after solvent annealing with carbon disulfide. Oxygen plasma treatment provided the final line arrays of iron oxides based on the formed nanostructural patterns

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