Characterization of the Chemical Kinetics in an O2/HMDSO RF Plasma for Material Processing | Zendy

R Barni | Zendy; Stefano Zanini | Zendy; C. ̃Riccardi | Zendy

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Characterization of the Chemical Kinetics in an O₂/HMDSO RF Plasma for Material Processing

Author(s) -

R Barni,

Stefano Zanini,

C. ̃Riccardi

Publication year - 2012

Publication title -

advances in physical chemistry

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.269

H-Index - 17

eISSN - 1687-7993

pISSN - 1687-7985

DOI - 10.1155/2012/205380

Subject(s) - hexamethyldisiloxane , plasma , mass spectrometry , analytical chemistry (journal) , spectroscopy , phase (matter) , chemistry , ion , characterization (materials science) , gas phase , plasma diagnostics , oxygen , materials science , chromatography , nanotechnology , physics , organic chemistry , quantum mechanics

Experimental study of the plasma gas phase in low-pressure radiofrequency discharges of oxygen and hexamethyldisiloxane is presented. The plasma phase has been studied by means of optical emission spectroscopy. Mass spectroscopy of the neutral and of the charged species has been performed too, directly sampling the plasma gas phase, by a dedicated spectrometer. We also measured the ion energy distribution. We have studied the influence of the operating conditions on the plasma gas-phase composition which plays a primary role in the formation process of SiO2 films, which are known for their important applicative uses

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