Inductively Coupled Plasma Sources and Applications | Zendy

T. Okumura | Zendy

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Inductively Coupled Plasma Sources and Applications

Author(s) -

T. Okumura

Publication year - 2010

Publication title -

physics research international

Language(s) - English

Resource type - Journals

eISSN - 2090-2239

pISSN - 2090-2220

DOI - 10.1155/2010/164249

Subject(s) - inductively coupled plasma , materials science , plasma , electromagnetic coil , inductance , inductive coupling , inductively coupled plasma mass spectrometry , inductively coupled plasma atomic emission spectroscopy , analytical chemistry (journal) , chromatography , electrical engineering , physics , chemistry , voltage , nuclear physics , mass spectrometry , engineering

The principle of inductively coupled plasma (ICP) and perspective of ICP development are reviewed. Multispiral coil ICP (MSC-ICP), which has the advantages of low inductance, high efficiency, and excellent uniformity, is discussed in detail. Applications to thin film processing technologies and the future prospects of ICP are also described

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