The Field Emission Properties of Graphene Aggregates Films Deposited on Fe‐Cr‐Ni alloy Substrates
Author(s) -
Zhanling Lu,
Wanjie Wang,
Xiaotian Ma,
Ning Yao,
Lan Zhang,
Binglin Zhang
Publication year - 2010
Publication title -
journal of nanomaterials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.463
H-Index - 66
eISSN - 1687-4129
pISSN - 1687-4110
DOI - 10.1155/2010/148596
Subject(s) - materials science , field electron emission , graphene , analytical chemistry (journal) , scanning electron microscope , raman spectroscopy , alloy , chemical vapor deposition , current density , transmission electron microscopy , nanotechnology , electron , composite material , optics , chemistry , physics , chromatography , quantum mechanics
The graphene aggregates films were fabricated directly on Fe-Cr-Ni alloy substrates by microwave plasma chemical vapor deposition system (MPCVD). The source gas was a mixture of H2 and CH4 with flow rates of 100 sccm and 12 sccm, respectively. The micro- and nanostructures of the samples were characterized by Raman scattering spectroscopy, field emission scanning electron microscopy (SEM), and transparent electron microscopy (TEM). The field emission properties of the films were measured using a diode structure in a vacuum chamber. The turn-on field was about 1.0 V/m. The current density of 2.1 mA/cm2 at electric field of 2.4 V/m was obtained
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