Open AccessOxide Thin Film Heterostructures on Large Area, with Flexible Doping, Low Dislocation Density, and Abrupt Interfaces: Grown by Pulsed Laser Deposition
Author(s) -
Michael Lorenz,
H. Hochmuth,
Christoph Grüner,
Helena Hilmer,
Alexander Lajn,
D. Spemann,
M. Brandt,
Jan Zippel,
Rüdiger SchmidtGrund,
Holger von Wenckstern,
Marius Grundmann
Publication year - 2010
Publication title -
laser chemistry
Language(s) - English
Resource type - Journals
eISSN - 1026-8014
pISSN - 0278-6273
DOI - 10.1155/2010/140976
Subject(s) - pulsed laser deposition , heterojunction , thin film , materials science , doping , optoelectronics , molecular beam epitaxy , oxide , ferroelectricity , chemical vapor deposition , metalorganic vapour phase epitaxy , nanotechnology , dielectric , epitaxy , layer (electronics) , metallurgy
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