Growth Mechanism of Cubic-Silicon Carbide Nanowires
Author(s) -
Kuan Yew Cheong,
Zainovia Lockman
Publication year - 2009
Publication title -
journal of nanomaterials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.463
H-Index - 66
eISSN - 1687-4129
pISSN - 1687-4110
DOI - 10.1155/2009/572865
Subject(s) - materials science , nanowire , silicon carbide , substrate (aquarium) , diffusion , chemical engineering , layer (electronics) , nanostructure , silicon , nanotechnology , phase (matter) , atomic diffusion , carbide , pyramid (geometry) , vapor phase , crystallography , composite material , metallurgy , oceanography , physics , chemistry , organic chemistry , engineering , thermodynamics , geology , optics
Cubic-SiC nanowires were synthesized using activated carbon powder and Si substrate in vacuum at 1200–1350°C for 1–4 hours. The nanowires were grown according to the following proposed mechanisms: (1) diffusion of C/CO into Si substrate, (2) weakening of Si bond and atomic kick-out, (3) formation of Si-C in vapor phase, (4) formation of saturated SiC layer, (5) formation of pyramid-like SiC nanostructure, and (6) formation of SiC nanowires
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom