Three-Dimensional Modeling of the Heat-Affected Zone in Laser Machining Applications
Author(s) -
Martynas Beresna,
Titas Gertus,
Rolandas Tomašiūnas,
Hiroaki Misawa,
Saulius Juodkazis
Publication year - 2008
Publication title -
laser chemistry
Language(s) - English
Resource type - Journals
eISSN - 1026-8014
pISSN - 0278-6273
DOI - 10.1155/2008/976205
Subject(s) - wafer dicing , laser , machining , laser cutting , thermal conductivity , thermal , dielectric , sapphire , thermal diffusivity , materials science , optoelectronics , composite material , optics , metallurgy , thermodynamics , physics , wafer
Thermal load as well as its three-dimensional (3D) spatial distribution has been estimated inside representative materials: glass (low thermal diffusion), silicon (semimetal properties), and sapphire (a crystalline dielectric of a high thermal conductivity) for typical laser processing and direct laser writing applications. The 3D temperature distribution allows to calculate thermal stress around the focal region. This provides an assessment tool for optimization of laser microprocessing conditions for controlled laser dicing and cutting applications
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