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Collimated Magnetron Sputter Deposition for Mirror Coatings
Author(s) -
Anette Vickery,
Carsten P. Jensen,
Finn E. Christensen,
Mads Peter Steenstrup,
Troels Schønfeldt
Publication year - 2008
Publication title -
x-ray optics and instrumentation
Language(s) - English
Resource type - Journals
eISSN - 1687-7640
pISSN - 1687-7632
DOI - 10.1155/2008/792540
Subject(s) - collimated light , sputter deposition , cavity magnetron , materials science , deposition (geology) , high power impulse magnetron sputtering , optoelectronics , optics , sputtering , thin film , nanotechnology , physics , geology , laser , paleontology , sediment
At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively

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