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During maskless ion etching of amorphous glass, self-organization can arise in certain etch parameter ranges, which leads to dense-lying dots/cones with typical diameters and heights in the 30–300 nm range. Another phenomenon, which results in cone sizes around 1  μ m or more, is self-masking especially in the case of heterogeneous glasses like borosilicate glass as used in this contribution. Thus, a wide range of characteristic sizes and shapes of individual scatterers on the glass surface, jointly acting as a defined roughness, can be achieved resulting in specific optical scattering characteristics. This contribution gives results on borosilicate thin-glass dry etching. Certain surface morphologies are reported together with experimental results on their optical scattering characteristics.

advances in optoelectronics

nm- and <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mi>μ</mml:mi></mml:math>m-Scale Surface Roughness on Glass with Specific Optical Scattering Characteristics on Demand

nm- and μm-Scale Surface Roughness on Glass with Specific Optical Scattering Characteristics on Demand