Influence of Electron-Electron Interaction on Electron Distributions in Short Si-MOSFETs Analysed Using the Local Iterative Monte Carlo Technique
Author(s) -
T. Mietzner,
J. Jakumeit,
U. Ravaioli
Publication year - 2001
Publication title -
vlsi design
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.123
H-Index - 24
eISSN - 1065-514X
pISSN - 1026-7123
DOI - 10.1155/2001/68217
Subject(s) - mosfet , monte carlo method , electron , electron scattering , scattering , materials science , computational physics , semiconductor , transistor , atomic physics , physics , condensed matter physics , optoelectronics , optics , quantum mechanics , mathematics , statistics , voltage
The effects of electron-electron interaction on the electron distribution in n-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) are studied using the Local Iterative Monte Carlo (LIMO) technique. This work demonstrates that electron-electron scattering can be efficiently treated within this technique. The simulation results of a 90 run Si-MOSFET are presented. We observe an increase of the high energy tail of the electron distribution at the transition from channel to drain
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom