Additive Decomposition Applied to the Semiconductor Drift-Diffusion Model
Author(s) -
E.J. Brauer,
Marek Turowski,
J. M. McDonough
Publication year - 1998
Publication title -
vlsi design
Language(s) - English
Resource type - Journals
eISSN - 1065-514X
pISSN - 1026-7123
DOI - 10.1155/1998/96170
Subject(s) - grid , scale (ratio) , turbulence , semiconductor , diffusion , computer science , domain decomposition methods , decomposition , power (physics) , decomposition method (queueing theory) , diode , computational science , mechanics , mathematics , materials science , physics , optoelectronics , chemistry , thermodynamics , finite element method , geometry , organic chemistry , discrete mathematics , quantum mechanics
A new numerical method for semiconductor device simulation is presented. The additivedecomposition method has been successfully applied to Burgers' and Navier-Stokesequations governing turbulent fluid flow by decomposing the equations into large-scaleand small-scale parts without averaging. The additive decomposition (AD) technique iswell suited to problems with a large range of time and/or space scales, for example,thermal-electrical simulation of power semiconductor devices with large physical size.Furthermore, AD adds a level of parallelization for improved computational efficiency.The new numerical technique has been tested on the 1-D drift-diffusion model of a p-i-ndiode for reverse and forward biases. Distributions of φ, n and p have been calculated using the AD method on a coarse large-scale grid and then in parallel small-scale gridsections. The AD results agreed well with the results obtained with a traditional one-gridapproach, while potentially reducing memory requirements with the new method
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