Kinetic Study of the Reaction of Rh(a4F9/2) with N2O, O2 and NO
Author(s) -
Mark L. Campbell
Publication year - 1998
Publication title -
laser chemistry
Language(s) - English
Resource type - Journals
eISSN - 1026-8014
pISSN - 0278-6273
DOI - 10.1155/1998/82640
Subject(s) - chemistry
The gas phase reactivity of Rh(a 4 F 9/2 ) with N 2 O, O 2 and NO is reported. Removal rateconstants for the excited states of rhodium below 13,000cm -1 are also reported. Thereaction rate of Rh(a 4 F 9/2 ) with N 2 O is relatively temperature insensitive. The rateconstants for the bimolecular reaction are described in Arrhenius form by ( 1.3 ± 0.3 ) × 10 − 12 exp ( − 1.3 ± 0.8 KJ/mol/RT ) cm 3 s − 1The reaction rates of the a 4 F9/2state with O 2 and NO are pressure dependent. For O 2 , the limiting low-pressure thirdorder,K 0 , and limiting high-pressure second-order, K ∞ , room temperature rate constants inargon buffer are ( 6.6 ± 0.6 ) × 10 − 30cm 6 s − 1and ( 2.1 ± 0.2 ) × 10 − 11cm 3 s − 1 , respectively.For NO, K 2 and K ∞ are( 1 .3 ± 0 .2 × 10 − 30cm 6 s − 1)and ( 2.1 ± 0.4 ) × 10 − 11cm 3 s − 1 ,respectively. The removal rates of the excited states are faster than the ground state by afactor of 2 or more.
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