z-logo
open-access-imgOpen Access
Kinetic Study of the Reaction of Rh(a4F9/2) with N2O, O2 and NO
Author(s) -
Mark L. Campbell
Publication year - 1998
Publication title -
laser chemistry
Language(s) - English
Resource type - Journals
eISSN - 1026-8014
pISSN - 0278-6273
DOI - 10.1155/1998/82640
Subject(s) - chemistry
The gas phase reactivity of Rh(a 4 F 9/2 ) with N 2 O, O 2 and NO is reported. Removal rateconstants for the excited states of rhodium below 13,000cm -1 are also reported. Thereaction rate of Rh(a 4 F 9/2 ) with N 2 O is relatively temperature insensitive. The rateconstants for the bimolecular reaction are described in Arrhenius form by ( 1.3 ± 0.3 ) × 10 − 12 exp ⁡ ( − 1.3 ± 0.8 KJ/mol/RT ) cm 3 s − 1The reaction rates of the a 4 F9/2state with O 2 and NO are pressure dependent. For O 2 , the limiting low-pressure thirdorder,K 0 , and limiting high-pressure second-order, K ∞ , room temperature rate constants inargon buffer are ( 6.6 ± 0.6 ) × 10 − 30cm 6 s − 1and ( 2.1 ± 0.2 ) × 10 − 11cm 3 s − 1 , respectively.For NO, K 2 and K ∞ are( 1 .3 ± 0 .2 × 10 − 30cm 6 s − 1)and ( 2.1 ± 0.4 ) × 10 − 11cm 3 s − 1 ,respectively. The removal rates of the excited states are faster than the ground state by afactor of 2 or more.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom