Macroscopic Device Simulation of InGaAs/InP Based Avalanche Photodiodes
Author(s) -
Joseph W. Parks,
Kevin F. Brennan,
L.E. Tarof
Publication year - 1998
Publication title -
vlsi design
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.123
H-Index - 24
eISSN - 1065-514X
pISSN - 1026-7123
DOI - 10.1155/1998/73839
Subject(s) - avalanche photodiode , optoelectronics , materials science , photodiode , voltage , diffusion , breakdown voltage , calibration , optics , detector , electrical engineering , physics , engineering , quantum mechanics , thermodynamics
In this paper, we analyze, based on a two-dimensional drift-diffusion simulation, how variationsin the structural components of an InGaAs/InP separate absorption, grading, charge, andmultiplication photodiode (SAGCM) alter its performance. The model is employed in conjunctionwith experimental measurements to enhance the understanding of the device performance.Calibration of the model to the material system and growth technique is performedvia the analysis of a simpler, alternate structure. Excellent agreement between the calculatedresults and experimental measurements of the breakdown voltage, dark current, mesa punchthroughvoltage, photoresponse, and gain are obtained
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