Impact Ionization and Hot‐Electron Injection DerivedConsistently from Boltzmann Transport
Author(s) -
P. Hasler,
Andreas G. Andreou,
C. Diorio,
B.A. Minch,
Carver Mead
Publication year - 1998
Publication title -
vlsi design
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.123
H-Index - 24
eISSN - 1065-514X
pISSN - 1026-7123
DOI - 10.1155/1998/73698
Subject(s) - boltzmann equation , ionization , hot carrier injection , impact ionization , electron , electron ionization , collision , boltzmann constant , hot electron , atomic physics , voltage , channel (broadcasting) , distribution function , electron transport chain , computational physics , materials science , physics , chemistry , ion , nuclear physics , computer science , thermodynamics , electrical engineering , engineering , computer security , transistor , quantum mechanics , biochemistry
We develop a quantitative model of the impact-ionizationand hot-electron–injectionprocesses in MOS devices from first principles. We begin by modeling hot-electrontransport in the drain-to-channel depletion region using the spatially varying Boltzmanntransport equation, and we analytically find a self consistent distribution function in atwo step process. From the electron distribution function, we calculate the probabilitiesof impact ionization and hot-electron injection as functions of channel current, drainvoltage, and floating-gate voltage. We compare our analytical model results tomeasurements in long-channel devices. The model simultaneously fits both the hot-electron-injection and impact-ionization data. These analytical results yield an energydependentimpact-ionization collision rate that is consistent with numerically calculatedcollision rates reported in the literature
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom