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Study of Electron Velocity Overshoot in NMOS Inversion Layers
Author(s) -
Wei-Kai Shih,
S. Jallepalli,
M. Rashed,
C.M. Maziar,
A.F. Tasch
Publication year - 1998
Publication title -
vlsi design
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.123
H-Index - 24
eISSN - 1065-514X
pISSN - 1026-7123
DOI - 10.1155/1998/65364
Subject(s) - electron , velocity overshoot , monte carlo method , scattering , physics , computational physics , quantization (signal processing) , inversion (geology) , electron scattering , mosfet , condensed matter physics , optics , geology , quantum mechanics , transistor , mathematics , paleontology , statistics , structural basin , algorithm , voltage
Non-local electron transport in nMOSFET inversion layers has been studied by MonteCarlo (MC) simulations. Inversion layer quantization has been explicitly included in thecalculation of density of states and scattering rate for low-energy electrons while bulkband structure is used to describe the transport of more energetic electrons. Foruniform, high-lateral field conditions, the effects of quantization are less pronounceddue to the depopulation of electrons in the lower-lying subbands. On the other hand,Monte Carlo results for carrier transport in spatially varying lateral fields (such as thosein the inversion layer of MOSFETs) clearly indicate that depopulation of the low-lyingsubbands is less evident in the non-local transport regime. Quasi-2D simulations haveshown that, at high transverse effective field, the inclusion of a quantization domaindoes have an impact on the calculated spatial velocity transient

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