Three‐Dimensional Hydrodynamic Modelingof MOSFET Devices
Author(s) -
Daniel C. Kerr,
Neil Goldsman,
I.D. Mayergoyz
Publication year - 1998
Publication title -
vlsi design
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.123
H-Index - 24
eISSN - 1065-514X
pISSN - 1026-7123
DOI - 10.1155/1998/60859
Subject(s) - discretization , mosfet , semiconductor device , relaxation (psychology) , mechanics , physics , statistical physics , mathematics , materials science , mathematical analysis , voltage , transistor , quantum mechanics , nanotechnology , psychology , social psychology , layer (electronics)
The hydrodynamic (HD) model of semiconductor devices is solved numerically inthree-dimensions (3-D) for the MOSFET device. The numerical instabilities of the HD modelare analyzed to develop a stable discretization. The formulation is stabilized by using a new,higher-order discretization for the relaxation-time approximation (RTA) term of theenergy-balance (EB) equation. The developed formulation is used to model the MOSFET
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