z-logo
open-access-imgOpen Access
Electrostatic Repulsion Between Highly Injecting Metals: An Experimental Investigation
Author(s) -
C.T. Dervos
Publication year - 1996
Publication title -
active and passive electronic components
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.144
H-Index - 22
eISSN - 1026-7034
pISSN - 0882-7516
DOI - 10.1155/1997/19198
Subject(s) - cathode , materials science , electrode , space charge , oxide , ion , dielectric , hysteresis , conductivity , capacitance , analytical chemistry (journal) , monolayer , chemical physics , chemistry , condensed matter physics , nanotechnology , optoelectronics , electron , physics , organic chemistry , quantum mechanics , chromatography , metallurgy
This paper is an experimental investigation of the major implications brought in the crossingresistance of mechanically contacted metals when operating in the high electronic injectionregime, i.e., steady state interfacial voltage values greater than the max. acceptable leveldetermined by specifications and less than the melting voltage. Under such operating conditions,monolayers of positive ions may be formed within interfacial cavities filled by thematerial from the surrounding space. The dominating ion neutralization process on the cathodecontrols the formation of “Helmholtz” inner layers at the metal cathode+oxide+gasinterface. The presence of a positive ion monolayer over the cathode electrode will tend toreduce the field threshold required for electronic field emission and affect the overall currentvoltagecharacteristics

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom