Realization of Solar Cells Based on Silicon/Oxide Junctions
Author(s) -
G. Campet,
Zhaoqi Sun,
P. Keou
Publication year - 1990
Publication title -
active and passive electronic components
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.144
H-Index - 22
eISSN - 1026-7034
pISSN - 0882-7516
DOI - 10.1155/1990/31452
Subject(s) - realization (probability) , silicon , materials science , layer (electronics) , sputtering , optoelectronics , anode , oxide , electrical conductor , chemical engineering , nanotechnology , thin film , electrode , chemistry , composite material , metallurgy , statistics , mathematics , engineering
Transparent and conductive films of SrTiO3 , ITO, and Tl2O3 have been deposited by R.F. cathodic sputtering and by anodic oxidation onto Si substrates in order to realize SIS cells. A photoconversion efficiency of 8.8% has been obtained for Si/SiOx/Tl2O3 cells. On the other hand for Si/SiOx/SrTiO3(ITO) the photoconversion efficiency is lower than 1% because of the too large thickness of the SiOx interfacial layer
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