Stability and Performance Characterization of Thick Film Microresistors | Zendy

Shobha C. Ravi | Zendy

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Stability and Performance Characterization of Thick Film Microresistors

Author(s) -

Shobha C. Ravi

Publication year - 1987

Publication title -

active and passive electronic components

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.144

H-Index - 22

eISSN - 1026-7034

pISSN - 0882-7516

DOI - 10.1155/1987/61728

Subject(s) - resistor , characterization (materials science) , thermal stability , materials science , sheet resistance , dimension (graph theory) , thermal resistance , thermal , temperature cycling , composite material , optoelectronics , electronic engineering , electrical engineering , nanotechnology , engineering , physics , thermodynamics , voltage , mathematics , layer (electronics) , chemical engineering , pure mathematics

In recent years, interest in the performance of small dimension resistors has increased primarily due to the needto reduce parasitic resistance in high frequency applications. This paper presents results on the characterizationof thick film microresistors, i.e. resistors of 80 × 80 mil to 10 × 10 mil dimension

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