Open AccessMimization of Incubation Layer in Nanocrystalline Silicon Films Prepared by Catalytic CVD At 100 °C
Author(s) -
TaeHo Song,
WanShick Hong
Publication year - 2013
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2013-01/2/38
Subject(s) - nanocrystalline material , layer (electronics) , materials science , silicon , chemical engineering , catalysis , incubation , nanocrystalline silicon , nanotechnology , metallurgy , chemistry , crystalline silicon , organic chemistry , engineering , amorphous silicon , biochemistry
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