Open AccessNon-Heating Atomic Layer Deposition of TiO2 by Using Plasma Excited Water Vapor
Author(s) -
Kensaku Kanomata,
Momiyama Katsuaki,
Suzuki Takahiko,
Shigeru Kubota,
Kazuhiro Hirahara,
Fumihiko Hirose
Publication year - 2013
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2013-01/2/16
Subject(s) - plasma , layer (electronics) , water vapor , excited state , deposition (geology) , atomic layer deposition , materials science , atomic physics , chemistry , nanotechnology , physics , geology , nuclear physics , paleontology , organic chemistry , sediment
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