z-logo
open-access-imgOpen Access
Advanced Characterization of a Direct Wafer Bonding-compatible Germanium Exfoliation Process
Author(s) -
Isabelle Ferain,
Xiaolu Kou,
Caroline Moulet-Ventosa,
Mark S. Goorsky,
Cindy Colinge
Publication year - 2012
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2012-02/40/2995
Subject(s) - germanium , wafer , materials science , characterization (materials science) , exfoliation joint , wafer bonding , direct bonding , nanotechnology , optoelectronics , silicon , graphene

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom