Open AccessInductively Coupled Plasma Etching of InP with Cl2/H2/Ar Plasma
Author(s) -
E Douglas,
J. Stevens,
R. J. Shul,
S. J. Pearton
Publication year - 2012
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2012-02/39/2924
Subject(s) - inductively coupled plasma , plasma , etching (microfabrication) , inductively coupled plasma mass spectrometry , plasma chemistry , plasma etching , materials science , analytical chemistry (journal) , chemistry , atomic physics , mass spectrometry , nanotechnology , physics , environmental chemistry , nuclear physics , chromatography , layer (electronics)
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom