Open AccessGlancing Angle Sputter-Deposition of Titanium Dioxide Films with Rotating Substrate Holder for Photocatalytic Application
Author(s) -
Yoji Yasuda,
Naoto Kitahara,
Y. Hoshi
Publication year - 2012
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2012-02/2/93
Subject(s) - photocatalysis , titanium dioxide , materials science , substrate (aquarium) , sputter deposition , sputtering , deposition (geology) , thin film , chemical engineering , titanium , nanotechnology , metallurgy , composite material , chemistry , geology , engineering , catalysis , paleontology , biochemistry , oceanography , sediment
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