Curvature Interferometry based In-Situ Measurement of Stresses Associated with Electrochemical Reactions
Author(s) -
Ömer Özgür Çapraz,
Pranav Shrotriya,
Kurt R. Hebert
Publication year - 2012
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2012-01/23/966
Subject(s) - in situ , interferometry , curvature , electrochemistry , materials science , optics , physics , mathematics , geometry , electrode , quantum mechanics , meteorology
Anodization1 as well as dissolution2 of reactive metals such as aluminum results in buildup of significant levels of stresses on the reacting surface. In-situ measurement of stress evolution can provide remarkable insights into the associated electrochemical reactions and help in understanding the governing mechanisms. We report a curvature interferometry based technique for in-situ monitoring of stress evolution. Curvature interferometer is incorporated into the electrochemical cell and is used to monitor the curvature changes of the samples in order to determine the stress-thickness product of the film formed on the reacting surface.
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