Open AccessScaling Requires Continuous Innovation in Thermal Processing: Low-Temperature Plasma Oxidation
Author(s) -
W. Lerch,
W. H. Kegel,
J. Niess,
A. Gschwandtner,
Jeffrey C. Gelpey
Publication year - 2012
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - Uncategorized
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2012-01/20/873
Subject(s) - scaling , plasma , rapid thermal processing , thermal , materials science , plasma processing , engineering physics , physics , thermodynamics , nuclear physics , mathematics , geometry
not Available.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom