Open AccessStress Techniques in Advanced Transistor Architectures: FinFETs and Implant-Free Quantum Well Transistors
Author(s) -
Geert Eneman,
Liesbeth Witters,
N. Collaert,
Jérôme Mitard,
Geert Hellings,
A. De Keersgieter,
Andriy Hikavyy,
Benjamin Vincent,
Paola Favia,
H. Bender,
A. Veloso,
T. Chiarella,
M. Togo,
Roger Loo,
K. De Meyer,
A. Mercha,
Naoto Horiguchi,
Aaron Thean
Publication year - 2012
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2012-01/16/696
Subject(s) - transistor , materials science , optoelectronics , stress (linguistics) , nanotechnology , electrical engineering , engineering , voltage , linguistics , philosophy
not Available.
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